Repository logo

Infoscience

  • English
  • French
Log In
Logo EPFL, École polytechnique fédérale de Lausanne

Infoscience

  • English
  • French
Log In
  1. Home
  2. Academic and Research Output
  3. Journal articles
  4. Devices and Circuits Using Novel 2-D Materials: A Perspective for Future VLSI Systems
 
research article

Devices and Circuits Using Novel 2-D Materials: A Perspective for Future VLSI Systems

Resta, Giovanni V.  
•
Leonhardt, Alessandra
•
Balaji, Yashwanth
Show more
July 1, 2019
Ieee Transactions On Very Large Scale Integration (Vlsi) Systems

Here, we review the most recent developments in the field of 2-D electronics. We focus first on the synthesis of 2-D materials, discussing the different growth techniques currently available and assessing their strengths and weaknesses. Moreover, we describe a possible roadmap to enable CMOS compatible integration of 2-D materials. We then shift our attention to 2-D devices and circuits and review the state of the art. Among the plethora of device concepts, we look closely at 2-D tunnel FETs (TFETs) and negative-capacitance FETs (NC-FETs) for low-power applications. We also put a particular emphasis on doping-free polarity-controllable systems that use electrostatic doping to eliminate the need for physical or chemical doping. We conclude with an analysis of simulations of scaled devices and discuss the possibilities enabled at circuit level by 2-D electronics.

  • Details
  • Metrics
Type
research article
DOI
10.1109/TVLSI.2019.2914609
Web of Science ID

WOS:000473489600002

Author(s)
Resta, Giovanni V.  
Leonhardt, Alessandra
Balaji, Yashwanth
De Gendt, Stefan
Gaillardon, Pierre-Emmanuel  
De Micheli, Giovanni  
Date Issued

2019-07-01

Publisher

IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC

Published in
Ieee Transactions On Very Large Scale Integration (Vlsi) Systems
Volume

27

Issue

7

Start page

1486

End page

1503

Subjects

Computer Science, Hardware & Architecture

•

Engineering, Electrical & Electronic

•

Computer Science

•

Engineering

•

2-d materials

•

beyond cmos

•

doping-free

•

growth

•

integration

•

low power

•

polarity control

•

scaling

•

transfer

•

transition metal dichalcogenides (tmdcs)

•

field-effect transistors

•

ab-initio simulation

•

negative-capacitance

•

mos2 transistors

•

black phosphorus

•

graphene

•

metal

•

transport

•

fets

•

heterostructures

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LSI1  
LSI2  
Available on Infoscience
July 17, 2019
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/159188
Logo EPFL, École polytechnique fédérale de Lausanne
  • Contact
  • infoscience@epfl.ch

  • Follow us on Facebook
  • Follow us on Instagram
  • Follow us on LinkedIn
  • Follow us on X
  • Follow us on Youtube
AccessibilityLegal noticePrivacy policyCookie settingsEnd User AgreementGet helpFeedback

Infoscience is a service managed and provided by the Library and IT Services of EPFL. © EPFL, tous droits réservés