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conference paper
Identification of amorphous silicon residues in a low power CMOS technology
Ajuria, S
•
Jakubczak, JF
1999
Proceedings of SPIE
A large variety of physical analysis techniques are used in the semiconductor industry to identify defects impacting yield or reliability. Identification of a defect often requires the combined use of several techniques to give a clear understanding of th
Type
conference paper
Authors
Acovic, A
•
Buffat, PA
•
Brander, P
•
Jacob, P
•
Jeandupeux, O
•
Marsico, V
•
Rosenfeld, D
•
Moser, J
•
Kohli, M
•
Fluckiger, R
Editors
Ajuria, S
•
Jakubczak, JF
Publication date
1999
Publisher
Published in
Proceedings of SPIE
ISBN of the book
0-8194-3481-7
Volume
3884
Start page
256
End page
264
Peer reviewed
REVIEWED
EPFL units
Event name | Event date |
1999 | |
Available on Infoscience
July 4, 2019
Use this identifier to reference this record