Details
Title
Kirner, Raoul
Sciper ID
258488
Publications
Array imaging system for lithography
Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography
Improvements on the uniformity of large-area microlens arrays in Fused Silica
Improving the resolution in mask-aligner lithography
Spatial coherence properties of an LED-based illumination system for mask-aligner lithography
Computational rule-based approach for corner correction of non-Manhattan geometries in mask aligner photolithography
Improvements on the uniformity of large-area microlens arrays in Fused Silica
Improving the resolution in mask-aligner lithography
Spatial coherence properties of an LED-based illumination system for mask-aligner lithography
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