Notice détaillée
Titre
Auzelyte, Vaida
Sciper ID
199500
Laboratoires affiliés
LMIS1
Publications
High aspect ratio etching of nanopores in PECVD SiC through AAO mask
High-density, high-aspect ratio epoxy microstructures by Direct Write Laser Patterning
Inkjet printing for MEMS
Large-Area Gold/Parylene Plasmonic Nanostructures Fabricated by Direct Nanocutting
Nanoelectromechanical systems (NEMS)
Nanostructured high refractive index titanium oxide films
One-step fabrication of high refractive index inorganic nanostructures
Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography
Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization
UV-Imprint Resists Generated from Polymerizable Ionic Liquids and Titania Nanoparticles
Voir toutes les publications (14)
High-density, high-aspect ratio epoxy microstructures by Direct Write Laser Patterning
Inkjet printing for MEMS
Large-Area Gold/Parylene Plasmonic Nanostructures Fabricated by Direct Nanocutting
Nanoelectromechanical systems (NEMS)
Nanostructured high refractive index titanium oxide films
One-step fabrication of high refractive index inorganic nanostructures
Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography
Solid-state nanopore array membranes patterned by electron beam lithography, nanosphere lithography and aluminum anodization
UV-Imprint Resists Generated from Polymerizable Ionic Liquids and Titania Nanoparticles
Voir toutes les publications (14)
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