Notice détaillée
Titre
Lister, Kevin
Sciper ID
174175
Laboratoires affiliés
CMI
Publications
High robustness of correlation-based alignment with Penrose patterns to marker damage in electron beam lithography
Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography
Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography
Employé pour
Lister, K. A.
Toutes les ressources
Toutes les ressources
Le document apparaît dans
Authorities > People