Details
Title
Lister, Kevin
Sciper ID
174175
Affiliated labs
CMI
Publications
High robustness of correlation-based alignment with Penrose patterns to marker damage in electron beam lithography
Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography
Phenyl-bridged polysilsesquioxane positive and negative resist for electron beam lithography
Use for
Lister, K. A.
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