System for aligning patterns on a substrate using stencil lithography
Perez Murano, Francesc; Arcamone, Julien; Sansa, Marc; Bruegger, Juergen; Van D N Boogart, Marc; Barniol Beumala, Nuria; Abadal Berini, Gabriel; Uranga Del Monte, Arantxa; Verd Martorell, Jaume
2010

Abstract

The invention relates to a system for aligning two or more patterns on a substrate using vacuum stencil lithography, such as to obtain optimum alignment precision. More specifically, the invention relates to a pattern-alignment system in which a mass sensor, which can detect material emitted, is placed in a known position behind the stencil, such that the position of the stencil can be ascertained as a function of the signal emitted by the sensor.

Details

Title System for aligning patterns on a substrate using stencil lithography
Author(s) Perez Murano, Francesc ; Arcamone, Julien ; Sansa, Marc ; Bruegger, Juergen ; Van D N Boogart, Marc ; Barniol Beumala, Nuria ; Abadal Berini, Gabriel ; Uranga Del Monte, Arantxa ; Verd Martorell, Jaume
Date 2010
Keywords
Note Alternative title(s) : (fr) Système d'alignement de motifs sur un substrat par lithographie stencil
Other identifier(s) EPO Family ID: 41501866
Patent number(s) ES2332082 (B1)
WO2010010224 (A1)
ES2332082 (A1)
Laboratories TTO
LMIS1
Record Appears in Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS1 - Microsystems Laboratory 1
Scientific production and competences > Non-academic units > TTO - Technology Transfer Office
Work produced at EPFL
Patents
Record creation date 2017-06-13