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patent
System for aligning patterns on a substrate using stencil lithography
2010
The invention relates to a system for aligning two or more patterns on a substrate using vacuum stencil lithography, such as to obtain optimum alignment precision. More specifically, the invention relates to a pattern-alignment system in which a mass sensor, which can detect material emitted, is placed in a known position behind the stencil, such that the position of the stencil can be ascertained as a function of the signal emitted by the sensor.
Type
patent
EPO Family ID
41501866
Inventors
Perez Murano, Francesc
•
Arcamone, Julien
•
Sansa, Marc
•
•
Van D N Boogart, Marc
•
Barniol Beumala, Nuria
•
Abadal Berini, Gabriel
•
Uranga Del Monte, Arantxa
•
Verd Martorell, Jaume
Note
Alternative title(s) : (fr) Système d'alignement de motifs sur un substrat par lithographie stencil
TTO classification
TTO:6.0819
Patent number | Country code | Kind code | Date issued |
ES2332082 | ES | B1 | 2010-10-26 |
WO2010010224 | WO | A1 | 2010-01-28 |
ES2332082 | ES | A1 | 2010-01-25 |
Available on Infoscience
June 13, 2017
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