Panel: Looking Backwards and Forwards

Ten years ago, at 90 nanometers, EDA was challenged and deemed inadequate in dealing with increasing complexity, power consumption, and sub-wavelength lithography, thus harming the progress of mobile phones. Today, at 10 nanometers, integration capacity has increased by two orders of magnitude, power consumption has been successfully "tamed", and 193 nanometer immersion lithography is still relied upon. Also thanks to EDA, tools, methodologies, and flows that were originally devised for design enablement for the emerging technology nodes, have been successfully redeployed at the established technology nodes, where they represent a critical design differentiation factor. However, the battleground is changing again: after the billions of phones, trillions of "things" lie ahead. Moving forward, emerging and established technology nodes, digital and analog, hardware and software will be equally critical. What is EDA doing and, more important, what should EDA do - and is not doing - in order for the next decade to be as great as the past one? This panel session, moderated by EPFL Professor Giovanni De Micheli, gathers academia, semiconductor, and EDA industry to discuss the challenges and requirements of the new era.


Publié dans:
Proceedings of the 2016 Design, Automation & Test In Europe Conference & Exhibition (DATE)), 571-575
Présenté à:
Design, Automation and Test in Europe Conference and Exhibition (DATE), Dresden, Germany, March 14-18, 2016
Année
2016
Publisher:
New York, IEEE
ISBN:
978-3-9815-3707-9
Laboratoires:




 Notice créée le 2016-10-18, modifiée le 2019-03-17

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