conference paper
Phenomenology of electron-beam-induced photoresist shrinkage trends
2009
SPIE Advanced Lithography
Type
conference paper
Author(s)
Bunday, Benjamin
Cordes, Aaron
Allgair, John
Avitan, Yohanan
Peltinov, Ram
Bar-zvi, Maayan
Adan, Ofer
Cottrell, Eric
Hand, Sean
Date Issued
2009
Published in
SPIE Advanced Lithography
Start page
72721B
End page
72721B
Editorial or Peer reviewed
REVIEWED
Written at
OTHER
EPFL units
Available on Infoscience
April 22, 2016
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