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conference paper
Phenomenology of electron-beam-induced photoresist shrinkage trends
2009
SPIE Advanced Lithography
Type
conference paper
Authors
Bunday, Benjamin
•
Cordes, Aaron
•
Allgair, John
•
•
Avitan, Yohanan
•
Peltinov, Ram
•
Bar-zvi, Maayan
•
Adan, Ofer
•
Cottrell, Eric
•
Hand, Sean
Publication date
2009
Published in
SPIE Advanced Lithography
Start page
72721B
End page
72721B
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
April 22, 2016
Use this identifier to reference this record