3D nanostructures fabricated by advanced stencil lithography

This letter reports on a novel fabrication method for 3D metal nanostructures using high-throughput nanostencil lithography. Aperture clogging, which occurs on the stencil membranes during physical vapor deposition, is leveraged to create complex topographies on the nanoscale. The precision of the 3D nanofabrication method is studied in terms of geometric parameters and material types. The versatility of the technique is demonstrated by various symmetric and chiral patterns made of Al and Au.


Published in:
Nanoscale, 9, 4945-4950
Year:
2016
Publisher:
Cambridge, Royal Soc Chemistry
Laboratories:


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 Record created 2016-03-16, last modified 2018-03-17

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