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  4. Critical impact of Ehrlich-Schwobel barrier on GaN surface morphology during homoepitaxial growth
 
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research article

Critical impact of Ehrlich-Schwobel barrier on GaN surface morphology during homoepitaxial growth

Kaufmann, Nils. A. K.  
•
Lahourcade, L.  
•
Hourahine, B.
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2016
Journal Of Crystal Growth

We discuss the impact of kinetics, and in particular the effect of the Ehrlich-Schwobel barrier (ESB), on the growth and surface morphology of homoepitaxial GaN layers. The presence of an ESB can lead to various self-assembled surface features, which strongly affect the surface roughness. We present an indepth study of this phenomenon on GaN homoepitaxial layers grown by metal organic vapor phase epitaxy and molecular beam epitaxy. We show how a proper tuning of the growth parameters allows for the control of the surface morphology, independent of the growth technique. (C) 2015 Published by Elsevier By.

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Type
research article
DOI
10.1016/j.jcrysgro.2015.06.013
Web of Science ID

WOS:000364819900007

Author(s)
Kaufmann, Nils. A. K.  
•
Lahourcade, L.  
•
Hourahine, B.
•
Martin, D.
•
Grandjean, N.  
Date Issued

2016

Publisher

Elsevier Science Bv

Published in
Journal Of Crystal Growth
Volume

433

Start page

36

End page

42

Subjects

Growth models

•

Metalorganic chemical vapor deposition

•

Molecular beam epitaxy

•

Nitrides

•

Semiconducting gallium compounds

•

Surface structure

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LASPE  
Available on Infoscience
February 16, 2016
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/123858
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