Microchannel plate and its manufacturing method
The present invention relates to a microchannel plate (1) having an array of channels (5), wherein said microchannel plate comprises a substrate (2) and, deposited on said substrate, a hydrogenated amorphous silicon film (3) having a thickness comprised between 50 [mu]m and 200 [mu]m, preferably comprised between 80 [mu]m and 120 [mu]m, said film comprising said array of channels (5). Preferably, the substrate (2) is an integrated circuit comprising an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on said substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.
41349132
Alternative title(s) : (de) Mikrokanalplatte und herstellungsverfahren dafür (fr) Plaque à microcanaux et son procédé de fabrication
TTO:6.0903
Patent number | Country code | Kind code | Date issued |
JP5559881 | JP | B2 | 2014-07-23 |
US8729447 | US | B2 | 2014-05-20 |
JP2012533860 | JP | A | 2012-12-27 |
EP2278609 | EP | B1 | 2012-12-05 |
US2012187278 | US | A1 | 2012-07-26 |
WO2011009730 | WO | A1 | 2011-01-27 |
EP2278609 | EP | A1 | 2011-01-26 |