Microchannel plate and its manufacturing method

The present invention relates to a microchannel plate (1) having an array of channels (5), wherein said microchannel plate comprises a substrate (2) and, deposited on said substrate, a hydrogenated amorphous silicon film (3) having a thickness comprised between 50 [mu]m and 200 [mu]m, preferably comprised between 80 [mu]m and 120 [mu]m, said film comprising said array of channels (5). Preferably, the substrate (2) is an integrated circuit comprising an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on said substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.

Other identifiers:
TTO: 6.0903
EPO Family ID: 41349132

 Record created 2015-09-22, last modified 2018-09-13

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