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patent
Stencil mask for accurate pattern replication
2007
The stencil mask diminishes thermal effects on alignment between stencil and substrate, and reduces the overall presence of a gap between stencil and substrate. In addition, this design allows for easy interchange of stencils, making local alterations of stencil apertures possible without the necessity for the fabrication of a completely new stencil.
Type
patent
EPO Family ID
38180139
Inventors
Note
Alternative title(s) : (fr) Masque stencil destiné à une reproduction précise de motif
TTO classification
TTO:6.0616
Patent number | Country code | Kind code | Date issued |
WO2007099518 | WO | A1 | 2007-09-07 |
Available on Infoscience
September 22, 2015
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