Infoscience

Conference paper

Low-frequency Noise Characterization of Dry-etched and Wet-etched InAlAs/InGaAs HEMTs

Low-frequency noise (LFN) characteristics of dry-and wet-etched InAlAs/InGaAs HEMTS have been studied. It is found that due to passivation of deep traps by hydrogen the excess LFN (1/f and G-R) in dry-etched HEMTs is significantly lower than in wet-etched devices. All the traps as detected by LFN were found to be located in the InAlAs barrier layer.

    Reference

    • EPFL-CONF-210886

    Record created on 2015-08-31, modified on 2016-08-09

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