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  4. Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy
 
research article

Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy

Rajesh, Sheeba
•
Bellouard, Yves  
2010
Optics Express

Femtosecond laser micromachining of glass material using low-energy, sub-ablation threshold pulses find numerous applications in the fields of integrated optics, lab-on-a-chips and microsystems in general. In this paper, we study the influence of the laser-deposited energy on the performance of the micromachining process. In particular, we show that the energy deposited in the substrate affects its etching rate. Furthermore, we demonstrate the existence of an optimal energy deposition value. These results are not only important from an industrial point-of-view but also provide new evidences supporting the essential role of densification and consequently stress-generation as the main driving factor promoting enhanced etching rate following laser exposure.

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Type
research article
DOI
10.1364/OE.18.021490
Author(s)
Rajesh, Sheeba
Bellouard, Yves  
Date Issued

2010

Publisher

Optical Society of America

Published in
Optics Express
Volume

18

Issue

20

Start page

21490

End page

21497

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
GALATEA  
Available on Infoscience
July 20, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/116394
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