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  4. Molecular understanding of the formation of surface zirconium Hydrides upon thermal treatment under hydrogen of [( SiO)Zr(CH(2)tBU)(3)] by using advanced solid-state NMR techniques
 
research article

Molecular understanding of the formation of surface zirconium Hydrides upon thermal treatment under hydrogen of [( SiO)Zr(CH(2)tBU)(3)] by using advanced solid-state NMR techniques

Rataboul, F
•
Baudouin, A
•
Thieuleux, C
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2004
Journal of the American Chemical Society

The reaction of [(dropSiO)Zr(CH(2)tBu)(3)] with H-2 at 150 degreesC leads to the hydrogenolysis of the zirconium-carbon bonds to form a very reactive hydride intermediate(s), which further reacts with the surrounding siloxane ligands present at the surface of this support to form mainly two different zirconium hydrides: [(dropSiO)(3)Zr-H] (1a, 70-80%) and [(dropSiO)(2)ZrH2] (1b, 20-30%) along with silicon hydrides, [(dropSiO)(3)SiH] and [(dropSiO)(2)SiH2]. Their structural identities were identified by H-1 DQ solid-state NMR spectroscopy as well as reactivity studies. These two species react with CO2 and N2O to give, respectively, the corresponding formate [(dropSiO)(4-x)Zr(O-C(=O)H)(x)] (2) and hydroxide complexes [(dropSiO)(4-x)Zr(OH)(x)] (x = 1 or 2 for 3a and 3b, respectively) as major surface complexes.

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Type
research article
DOI
10.1021/ja038486h
Web of Science ID

WOS:000224219900074

Author(s)
Rataboul, F
Baudouin, A
Thieuleux, C
Veyre, L
Coperet, C
Thivolle-Cazat, J
Basset, JM
Lesage, A
Emsley, L  
Date Issued

2004

Publisher

AMER CHEMICAL SOC

Published in
Journal of the American Chemical Society
Volume

126

Issue

39

Start page

12541

End page

12550

Editorial or Peer reviewed

REVIEWED

Written at

OTHER

EPFL units
LRM  
Available on Infoscience
January 8, 2015
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/110098
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