Water adsorption on etched hydrophobic surfaces of L-, D- and DL-valine crystals

The adsorption of water on etched (001) surfaces of L-, D- and DL-valine crystals has been characterized by atomic force microscopy (AFM) using different operational modes (contact, non-contact and electrostatic) above and below the dew point, the temperature at which water vapor from humid air condenses into liquid water at constant atmospheric pressure. The analysis of the images suggests the formation of aggregates of solvated valine molecules that easily diffuse on the hydrophobic terraces only constrained by step barriers of the well-defined chiral parallelepipedic patterns induced by the etching process. (C) 2013 Elsevier B.V. All rights reserved.


Published in:
Surface Science, 621, 191-196
Year:
2014
Publisher:
Amsterdam, Elsevier
ISSN:
0039-6028
Keywords:
Laboratories:




 Record created 2014-04-02, last modified 2018-01-28


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