Accelerated bacterial inactivation obtained by HIPIMS sputtering on low cost surfaces with concomitant reduction in the metal/semiconductor content

Novel ultrathin TiO2-Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO2-Cu-ions (M+) with the polyester surface due to the high fraction and density of M+-ions interacting with the biased substrate.


Published in:
Rsc Advances, 3, 32, 13127-13130
Year:
2013
Publisher:
Cambridge, RSC Publishing
ISSN:
2046-2069
Laboratories:




 Record created 2013-10-01, last modified 2018-09-13

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