Deep reactive ion etching and focused ion beam combination for nanotip fabrication

We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a focused ion beam to obtain nanotips at their apex. Typical results obtained are nanotips with a basis radius of 200 nm and a height of 2.5 mu m, with an apex radius of 5 nm, located on top of a 3 mu m wide and 9 mu m high silicon column. The process would allow however obtaining column heights of several tens of microns. (c) 2006 Elsevier B.V All rights reserved.


Published in:
Materials Science & Engineering C-Biomimetic and Supramolecular Systems, 26, 2-3, 164-168
Year:
2006
ISSN:
0928-4931
Keywords:
Note:
Plaza, JA CSIC, Ctr Nacl Microelect, IMB, Campus UAB, Barcelona, Spain CSIC, Ctr Nacl Microelect, IMB, Barcelona, Spain CREBEC, Nanobioengn Lab, Barcelona 08028, Spain
Sp. Iss. SI
021VQ
Times Cited:2
Cited References Count:10
Laboratories:




 Record created 2013-08-06, last modified 2018-12-03

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