DRIE based novel technique for AFM probes fabrication

We report on the fabrication of atomic force microscopy (AFM) probes using a novel technology that performs every machining step by means of one single deep reactive ion etching (DRIE) equipment. Specific etching conditions are optimized in order to define rocket tips (apex and shaft parts of the tip are etched separately). Then, those rocket tips are fabricated on cantilevers obtaining finally complete AFM probes. DRIE is also used to shape the cantilevers and to machine the whole silicon wafer. Very high yield and very high uniformity are obtained because of the use of dry etchings. Customized fabrication of AFM probes with similar features than the reference ones is demonstrated. (c) 2007 Elsevier B.V. All rights reserved.


Published in:
Microelectronic Engineering, 84, 5-8, 1132-1135
Year:
2007
ISSN:
0167-9317
Keywords:
Note:
Villanueva, G CSIC, CNM, IMB, Campus UAB, Bellaterra 08193, Spain CSIC, CNM, IMB, Bellaterra 08193, Spain
177WF
Times Cited:0
Cited References Count:25
Laboratories:




 Record created 2013-08-06, last modified 2018-03-17

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