Focused ion beam production of nanoelectrode arrays
We present a method for the production of nanoelectrodes using focussed ion beam techniques (FIB). The electrodes utilise nanometric holes milled in a silicon nitride based pasivation layer, followed by wet etching of a silicon oxide based pasivation layer, to expose an underlying gold electrode. After functionalisation using a surface assembled monolayer and an electrochemically grown polypyrrole, these gold nanoelectrodes have been tested, via cyclic voltammetry, in the detection of [Fe(CN)(6)](4-/3-) ions. The nanoelectrodes will be used to investigate the electrical properties of nanometric biological specimen. (c) 2007 Elsevier B.V. All rights reserved.
Errachid, A Univ Barcelona, Nanobioengn Res Lab IBEC, CIBER, C Marti I Franques 1, E-08028 Barcelona, Spain Univ Barcelona, Nanobioengn Res Lab IBEC, CIBER, E-08028 Barcelona, Spain Univ Barcelona, Dept Elect, CIBER, E-08028 Barcelona, Spain CSIC, IMB, Ctr Nacl Microelect, Bellaterra 08193, Spain ICMAB CSIC, Barcelona, Spain
Sp. Iss. SI
Cited References Count:18
Record created on 2013-08-06, modified on 2016-08-09