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research article

Low ion energy RF reactor using an array of plasmas through a grounded grid

Chesaux, Michael
•
Howling, Alan A.
•
Hollenstein, Christoph
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2013
Journal Of Vacuum Science & Technology A

A reactor using localized remote plasma in a grid electrode is presented in this study. The aim is to reduce the ion bombardment energy inherent in RF capacitively coupled parallel plate reactors used to deposit large area thin film silicon solar cells. High ion bombardment energy could cause defects in silicon layers and deteriorate electrical interfaces, therefore, by reducing the ion bombardment energy, lower defect density might be obtained. In this study, the low ion bombardment energy results from the reactor design. By inserting a grounded grid close to the RF electrode of a parallel plate reactor, the electrode area asymmetry is increased while retaining the lateral uniformity required for large area deposition. This asymmetry causes a strong negative self-bias voltage, which reduces the time-averaged plasma potential and thus lowers the ion bombardment energy. In addition to the self-bias, the time evolution of plasma light emission and plasma potential RF waveform are also affected by the grid, thereby further reducing the time-averaged plasma potential and ion bombardment energy. Finally, a good correlation between the measured time-averaged plasma potential and measured low ion bombardment energy is found in a broad range of RF voltages. (C) 2013 American Vacuum Society. [http://dx.doi.org/10.1116/1.4790423]

  • Details
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Type
research article
DOI
10.1116/1.4790423
Web of Science ID

WOS:000315595700011

Author(s)
Chesaux, Michael
Howling, Alan A.
Hollenstein, Christoph
Domine, Didier
Kroll, Ulrich
Date Issued

2013

Publisher

A V S Amer Inst Physics

Published in
Journal Of Vacuum Science & Technology A
Volume

31

Issue

2

Article Number

021302

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

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Available on Infoscience
March 28, 2013
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/90691
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