Silicon based micro-optical collimating element for mid-infrared Quantum Cascade Lasers

A realization of a high numeric aperture, aspheric, silicon based collimating element for the mid-infrared (4 – 14 microns) Quantum Cascade Lasers, suited for mass production using computer driven reactive ion etching is presented.


Presented at:
8th International Conference on Optics-photonics Design & Fabrication, St. Petersburg, Russia, 2-5 July, 2012
Year:
2012
Keywords:
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 Record created 2013-01-31, last modified 2018-01-28

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