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  4. Design-dependent gauge factors of highly doped n-type 4H-SiC piezoresistors
 
research article

Design-dependent gauge factors of highly doped n-type 4H-SiC piezoresistors

Akiyama, T.  
•
Briand, D.  
•
de Rooij, N. F.  
2012
Journal of Micromechanics and Microengineering

This paper presents the experimentally obtained gauge factor (GF) of 4H-SiC piezoresistors, fabricated out of the n-type epitaxial layer and characterized on millimeter-size SiC cantilever beams at room temperature. It was found that the GF is dependent on the piezoresistor's length and width. Piezoresistors narrower than approximately 30 mu m showed a width-dependent GF. The highest GF of 20.8 was obtained with a single element piezoresistor in transverse orientation. In longitudinal orientation, the highest GF was -10, which was obtained with a clustered piezoresistor with plural identical elements. Essential factors to consider for the design of optimum 4H-SiC piezoresistors for a Wheatstone bridge configuration are presented.

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Type
research article
DOI
10.1088/0960-1317/22/8/085034
Web of Science ID

WOS:000306649000034

Author(s)
Akiyama, T.  
Briand, D.  
de Rooij, N. F.  
Date Issued

2012

Published in
Journal of Micromechanics and Microengineering
Volume

22

Issue

8

Article Number

085034

Editorial or Peer reviewed

NON-REVIEWED

Written at

EPFL

EPFL units
SAMLAB  
Available on Infoscience
August 23, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/85011
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