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conference paper
Tailoring of Optical Properties of Alumina films deposited by High Vacuum CVD (HV-CVD)
2009
ECS Transactions
The deposition of amorphous alumina (Al2O3) films on four inch wafers with high deposition rate (up to 50 nm/min) by an advanced HV-CVD technique is discussed. Amorphous nature of the films is confirmed by X-ray diffraction. Refractive index of the deposited alumina can be adjusted in the large range (1.3-1.62@633 nm) by varying the substrate temperate during the deposition. The films are highly transparent. The density and stoichiometry of the deposits are also influenced by deposition conditions. Presence of -OH groups is observed in some cases.
Type
conference paper
Authors
Publication date
2009
Publisher
Published in
ECS Transactions
Volume
25
Issue
8
Start page
1093
End page
1098
Peer reviewed
NON-REVIEWED
Event name | Event place | Event date |
Vienna, Austria | October 4 - October 9, 2009 | |
Available on Infoscience
July 10, 2012
Use this identifier to reference this record