Tailoring of Optical Properties of Alumina films deposited by High Vacuum CVD (HV-CVD)

The deposition of amorphous alumina (Al2O3) films on four inch wafers with high deposition rate (up to 50 nm/min) by an advanced HV-CVD technique is discussed. Amorphous nature of the films is confirmed by X-ray diffraction. Refractive index of the deposited alumina can be adjusted in the large range (1.3-1.62@633 nm) by varying the substrate temperate during the deposition. The films are highly transparent. The density and stoichiometry of the deposits are also influenced by deposition conditions. Presence of -OH groups is observed in some cases.


Published in:
ECS Transactions, 25, 8, 1093-1098
Presented at:
EuroCVD 17/CVD 17, Vienna, Austria, October 4 - October 9, 2009
Year:
2009
Publisher:
ECS - The Electrochemical Society
ISSN:
1938-5862
Laboratories:




 Record created 2012-07-10, last modified 2018-09-13


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