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conference paper
Combination of Electron or Laser Beam Irradiation with High Vacuum Chemical Vapor Deposition (HV-CVD) of Al2O3 for in-situ Local Structuring on Wafer Scale Substrate
2009
ECS Transactions
A laser or electron beam assisted deposition in HV-CVD conditions was used in order to achieve structured amorphous alumina (Al2O3) deposits. Selective deposition of Al2O3 in the irradiated regions has been demonstrated. We investigate the influence of irradiation parameters on the deposition rate and composition of the deposits. The technique is aimed to be used on full wafer substrates.
Type
conference paper
Authors
Editors
Swihart, M.
•
Barreca, D.
•
Adomaitis, R.
•
Worhoff, K.
Publication date
2009
Publisher
Published in
ECS Transactions
Volume
25
Issue
8
Start page
1087
End page
1092
Peer reviewed
REVIEWED
Written at
EPFL
| Event name | Event place | Event date |
Vienna, Austria | October 4 - October 9, 2009 | |
Available on Infoscience
July 10, 2012
Use this identifier to reference this record