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research article
Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
2011
Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
Type
research article
Web of Science ID
WOS:000298354900008
Authors
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Wagner, Estelle
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•
Rushworth, Simon A.
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Publication date
2011
Published in
Volume
12
Start page
3524
End page
3528
Peer reviewed
REVIEWED
Available on Infoscience
June 25, 2012
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