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research article

Resonant planar antenna as an inductive plasma source

Guittienne, Ph.
•
Lecoultre, S.
•
Fayet, P.
Show more
2012
Journal of Applied Physics

A resonant planar antenna as an inductive plasma source operating at 13.56 MHz inside a low pressure vacuum vessel is presented for potential plasma processing applications. Its principle consists in interconnecting elementary resonant meshes composed of inductive and capacitive elements. Due to its structure, the antenna shows a set of resonant modes associated with peaks of the real input impedance. Each of these modes is defined by its own current and voltage distribution oscillating at the frequency of the mode. A rectangular antenna of 0.55 m x 0.20 m has been built, and first results obtained with argon plasmas are presented. Plasma generation is shown to be efficient as densities up to 4 x 10(17) m(-3) at 2000 W have been measured by microwave interferometry at a distance of 4 cm from the source plane. It is also demonstrated that the plasma couples inductively with the resonating currents flowing in the antenna above a threshold power of about 60 W. A non-uniformity of less than +/- 5% is obtained at 1000 W at a few centimeters above the antenna over 75% of its surface. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.4705978]

  • Details
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Type
research article
DOI
10.1063/1.4705978
Web of Science ID

WOS:000303598800014

Author(s)
Guittienne, Ph.
Lecoultre, S.
Fayet, P.
Larrieu, J.
Howling, A. A.
Hollenstein, Ch.
Date Issued

2012

Published in
Journal of Applied Physics
Volume

111

Article Number

083305

Subjects

Large-Area

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

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Available on Infoscience
June 1, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/81232
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