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research article

Plasma generation by inductive coupling with a planar resonant RF network antenna

Lecoultre, S.
•
Guittienne, Ph
•
Howling, A. A.
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2012
Journal Of Physics D-Applied Physics

A planar antenna operating at 13.56MHz is presented for potential applications in plasma processing. It consists of interconnected elementary resonant meshes composed of inductive and capacitive elements. Due to its structure, the antenna exhibits a set of resonant modes associated with peaks of the real input impedance. Each mode is defined by its particular distribution of current and voltage oscillating at the frequency of the mode. A rectangular antenna of 0.55m x 0.20m has been built and first results obtained with argon plasmas are presented. Efficient plasma generation is shown by plasma densities above 3 x 10(17) m(-3) at 2000 W with reasonable uniformity over the antenna area. The plasma couples inductively with the resonating currents flowing in the antenna above a threshold power of about 60 W. The real input impedance at antenna resonance avoids the problem of strong reactive currents and voltages in the matching box and RF power connections associated with conventional large-area plasma sources. Resonant RF networks have a strong potential interest for various designs of plasma sources.

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Type
research article
DOI
10.1088/0022-3727/45/8/082001
Web of Science ID

WOS:000300606300001

Author(s)
Lecoultre, S.
Guittienne, Ph
Howling, A. A.
Fayet, P.
Hollenstein, Ch
Date Issued

2012

Published in
Journal Of Physics D-Applied Physics
Volume

45

Article Number

082001

Subjects

Large-Area

•

Discharge

Editorial or Peer reviewed

REVIEWED

Written at

EPFL

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Available on Infoscience
March 22, 2012
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/78955
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