Highly transparent ZnO bilayers by LP-MOCVD as front electrodes for thin-film micromorph silicon solar cells

ZnO bilayer films were deposited by a low-pressure metalorganic chemical vapor deposition technique in a single process step, by doping with boron only the nucleation stage of the growth. The resulting 2 pm thick layers are characterized by low free carrier absorption and electron mobilities over 40 cm(2)/Vs. They therefore combine high transparency in the infrared region and moderate sheet resistances of 30 Omega/sq. It is thought that the controlled introduction of boron in the early nucleation stage enables its diffusion through the layer, resulting in a very efficient reduction of the sheet resistance compared to samples deposited without doping, while preserving a strong light-scattering interface. These properties make ZnO bilayers ideal electrodes for the development of micromorph thin-film solar cells with enhanced photogenerated current. (C) 2011 Elsevier B.V. All rights reserved.


Published in:
Solar Energy Materials And Solar Cells, 98, 331-336
Year:
2012
Publisher:
Elsevier
ISSN:
0927-0248
Keywords:
Note:
IMT-NE Number: 652; IMT-NE Number: 679
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2012-03-22, last modified 2018-03-17

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