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  4. Electronic structural details of donor-vacancy complexes in Si-doped Ge and Ge-doped Si
 
conference paper

Electronic structural details of donor-vacancy complexes in Si-doped Ge and Ge-doped Si

Coutinho, J.
•
Castro, F.
•
Torres, V. J. B.
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2010
Thin Solid Films
Symposium on Silicon and Germanium Issues for Future CMOS Devices held at the 2009 E-MRS Spring Meeting

We present a detailed picture of the electronic structure of donor-vacancy complexes in Ge-doped silicon and Si-doped germanium Clusters to mimic Si-rich and Ge-rich SiGe alloys, respectively Jahn-Teller effects and electrical levels were investigated in both Si-rich and Ge-rich end compositions It is shown that while Ge atoms act as efficient traps for mobile E-centers in Si-rich alloys, Si atoms in Ge-rich material do not have this ability A detailed linear combination of atomic orbitals model is proposed for VP-Ge and VP-Si complexes in Si1-xGex and Ge1-xSix, where the orbital filling order is driven by the larger electron affinity of Si atoms when compared to Ge. (C) 2009 Elsevier B.V. All rights reserved

  • Details
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Type
conference paper
DOI
10.1016/j.tsf.2009.09.168
Web of Science ID

WOS:000275615100021

Author(s)
Coutinho, J.
Castro, F.
Torres, V. J. B.
Carvalho, A.
Barroso, M.
Briddon, P. R.
Date Issued

2010

Published in
Thin Solid Films
Volume

518

Start page

2381

End page

2385

Subjects

Silicon

•

Germanium

•

Donor

•

Vacancy

•

Space Gaussian Pseudopotentials

•

Point-Defects

•

Silicon

•

Germanium

•

Alloys

•

Pair

Editorial or Peer reviewed

NON-REVIEWED

Written at

EPFL

EPFL units
LC  
Event nameEvent placeEvent date
Symposium on Silicon and Germanium Issues for Future CMOS Devices held at the 2009 E-MRS Spring Meeting

Strasbourg, FRANCE

Jun 08-12, 2009

Available on Infoscience
December 16, 2011
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/75656
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