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research article
Combinatorial Discovery and Optimization of Amorphous HfO2-Nb2O5 Mixture with Improved Transparency
Combinatorial high vacuum chemical vapor deposition (HV-CVD) of mixed HfO2-Nb2O5 thin films has been demonstrated to yield amorphous layers at substrate temperatures where individually deposited pure HfO2 and Nb2O5 films are polycrystalline. Spectroscopic ellipsometry of the films shows that adding HfO2 to Nb2O5 improves the transparency of the films while still maintaining a high refractive index. Atomic force microscopy measurements show that the root-mean-square surface roughness of the films is about 1.2 nm. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3407618] All rights reserved.
Type
research article
Web of Science ID
WOS:000277558200017
Authors
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Afra, Bamdad
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Wagner, Estelle
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Sandu, Cosmin S.
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Rushworth, Simon
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Publication date
2010
Publisher
Published in
Volume
13
Start page
G60
End page
G63
Peer reviewed
REVIEWED
Available on Infoscience
December 16, 2011
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