Loading...
conference paper
Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale
2010
Fundamentals And Technology Of Multifunctional Oxide Thin Films (Symposium G, Emrs 2009 Spring Meeting)
A systematic study of niobium oxide deposition using niobium tetraethoxy-dimethyl-amino-ethoxide (Nb(OEt)(4)(dmae)) precursor is presented. The deposition process was conducted in a high-vacuum chemical vapor deposition machine with precursor flux gradient capability. An efficient optimization of the deposition process was achieved and both mass-transport- and chemical-reaction-limited regimes were identified.
Type
conference paper
Web of Science ID
WOS:000287790000026
Authors
Dabirian, A.
•
•
Harada, S.
•
Parsons, C.
•
Sandu, S. C.
•
Wagner, E.
•
•
Rushworth, S.
•
Muralt, P.
•
Publication date
2010
Published in
Fundamentals And Technology Of Multifunctional Oxide Thin Films (Symposium G, Emrs 2009 Spring Meeting)
Series title/Series vol.
IOP Conference Series-Materials Science and Engineering
Volume
8
Start page
012026
Subjects
Peer reviewed
NON-REVIEWED
Event name | Event place | Event date |
Strasbourg, FRANCE | Jun 08-12, 2009 | |
Available on Infoscience
December 16, 2011
Use this identifier to reference this record