Modeling study of capacitance and gate current in strained HighK-Metal gate technology
2010
Details
Title
Modeling study of capacitance and gate current in strained HighK-Metal gate technology
Author(s)
Garetto, Davide ; Rideau, Denis ; Dornel, Erwan ; Clark, William F. ; Tavernier, Clement ; Leblebici, Yusuf ; Schmid, Alexandre ; Jaouen, Hervé
Conference
13th International Nanotech Conference, 2010
Date
2010
Publisher
NSTI
Laboratories
LSM
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LSM - Microelectronic Systems Laboratory
Conference Papers
Work produced at EPFL
Published
Conference Papers
Work produced at EPFL
Published
Record creation date
2011-10-31