Energy flow in light-coupling masks for lensless optical lithography

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist. (C) 1998 Optical Society of America


Published in:
Optics Express, 3, 280-285
Year:
1998
Publisher:
Optical Society of America
ISSN:
1094-4087
Laboratories:




 Record created 2011-04-11, last modified 2018-03-17

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