000164849 001__ 164849
000164849 005__ 20180913060550.0
000164849 0247_ $$2doi$$a10.1016/S0167-9317(03)00167-9
000164849 022__ $$a01679317
000164849 02470 $$2ISI$$a000183842100005
000164849 037__ $$aCONF
000164849 245__ $$aSurface plasmon illumination scheme for contact lithography beyond the diffraction limit
000164849 269__ $$a2003
000164849 260__ $$c2003
000164849 336__ $$aConference Papers
000164849 520__ $$aA novel local illumination scheme for optical lithography is proposed. It is based on the excitation of a surface plasmon on a metal film incorporated into a polymer light coupling mask for contact lithography. The electromagnetic field associated with the surface plasmon generates illumination volumes in the photoresist which are not limited by the diffraction (or Rayleigh) limit. Computer simulations indicate that the replication of 20 nm features using 630 nm illumination wavelength can be achieved with this technique. (C) 2003 Elsevier Science B.V. All rights reserved.
000164849 6531_ $$asurface plasmons
000164849 6531_ $$acontact lithography
000164849 6531_ $$acontrast mechanism
000164849 6531_ $$ascattering calculation
000164849 6531_ $$aLight-Coupling Masks
000164849 6531_ $$aNear-Field
000164849 6531_ $$aConfinement
000164849 6531_ $$aMicroscopy
000164849 6531_ $$aScattering
000164849 6531_ $$aLensless
000164849 700__ $$0244723$$aMartin, O.J.F.$$g159310
000164849 7112_ $$a28th International Conference on Micro- and Nano-Engineering$$cLUGANO, SWITZERLAND$$dSep 16-19, 2002
000164849 773__ $$j67-8$$knull$$q24-30$$tMicroelectronic Engineering
000164849 8564_ $$s343453$$uhttps://infoscience.epfl.ch/record/164849/files/067.pdf$$zn/a
000164849 909C0 $$0252353$$pNAM$$xU10373
000164849 909CO $$ooai:infoscience.tind.io:164849$$pconf$$pSTI
000164849 937__ $$aEPFL-CONF-164849
000164849 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000164849 980__ $$aCONF