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research article

The Raman spectroscopy of diamond films deposited on metal and insulator substrates with varying thermal expansion coefficient

Fabisiak, K.
•
Philippoz, J. M.
•
Van den Bergh, H.  
1992
Diamond and Related Materials

Polycryst. diamond films were deposited by hot filament assisted chem. vapor deposition on five metal and insulator substrates. The films obtained were studied by Raman spectroscopy. The position of the Raman line shifts to higher wavenumbers when the thermal expansion coeff. of the substrate material increases. This effect is interpreted as a result of the internal stress in the diamond films induced by the cooling from the deposition temp. to room temp. The width of the Raman peak ranges from 10.9 to 16.6 cm-1, with a min. when the thermal expansion coeff. of the substrate is close to that of diamond.

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Type
research article
DOI
10.1016/0925-9635(92)90003-7
Author(s)
Fabisiak, K.
•
Philippoz, J. M.
•
Van den Bergh, H.  
Date Issued

1992

Published in
Diamond and Related Materials
Volume

1

Issue

2-4

Start page

77

End page

82

Subjects

60676-86-0 (Fused quartz) Role: USES (Uses) (Raman shift of diamond films on substrate of)

•

1344-28-1 (Aluminum oxide)

•

7439-98-7 (Molybdenum)

•

7440-21-3 (Silicon)

•

7440-25-7 (Tantalum) Role: PRP (Properties) (Raman shift of diamond films on substrate o

•

Raman diamond film metal insulator substrate

Note

Copyright 2003 ACS

CAPLUS

AN 1992:265064

CAN 116:265064

73-10

Optical, Electron, and Mass Spectroscopy and Other Related Properties

Lab. Chim. Tech.,EPFL,Lausanne,Switz. FIELD URL:

Journal

DRMTE3

written in English.

Raman spectra (of diamond films deposited on metal or insulator substrates with different thermal expansion coeff.)

Peer reviewed

REVIEWED

Written at

EPFL

EPFL units
LPAS  
Available on Infoscience
February 1, 2011
Use this identifier to reference this record
https://infoscience.epfl.ch/handle/20.500.14299/63695
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