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research article
Fabrication of nanopore arrays and ultrathin silicon nitride membranes by block-copolymer-assisted lithography
2009
Here we show a method for patterning a thin metal film using self-assembled block-copolymer micelles monolayers as a template. The obtained metallic mask is transferred by reactive ion etching in silicon oxide, silicon and silicon nitride substrates, thus fabricating arrays of hexagonally packed nanopores with tunable diameters, interspacing and aspect ratios. This technology is compatible with integration into a standard microtechnology sequence for wafer-scale fabrication of ultrathin silicon nitride nanoporous membranes with 80 nm mean pore diameter.
Type
research article
Web of Science ID
WOS:000271471300007
Authors
Publication date
2009
Published in
Volume
20
Issue
48
Article Number
485303
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
November 30, 2010
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