Direct writing laser of high aspect ratio epoxy microstructures
The development of high aspect ratio (AR) structures is of great interest in several ﬁelds such as micro-electro-mechanical systems or microﬂuidics. In this note we present a new processing method of epoxy materials based on direct write laser (DWL) scanning exposure. In this work, we describe the application of this technique for fast prototyping, and the cost-efﬁcient fabrication of structures with a high AR over 40. Such properties demonstrate the proposed DWL of epoxy materials as a promising candidate for the development of polymer-based microsystems.