Fabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes

We present a much simpler and high-throughput method compared to mechanically break junctions (MBJ) and electro-migration, to produce a heterogeneous nanogap, directly using electron beam lithography and metal lift-off technology. Au – Pt and Au – Pt silicide electrodes pairs are fabricated using two-step electron beam lithography. The shape of the electrode apex and the distance between the electrodes are well controlled.


Présenté à:
36th International Conference on Micro & Nano Engineering (MNE 2010), Genova, Italy, September 19-22, 2010
Année
2010
Laboratoires:




 Notice créée le 2010-11-04, modifiée le 2018-09-13


Évaluer ce document:

Rate this document:
1
2
3
 
(Pas encore évalué)