Fabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes

We present a much simpler and high-throughput method compared to mechanically break junctions (MBJ) and electro-migration, to produce a heterogeneous nanogap, directly using electron beam lithography and metal lift-off technology. Au – Pt and Au – Pt silicide electrodes pairs are fabricated using two-step electron beam lithography. The shape of the electrode apex and the distance between the electrodes are well controlled.


    • EPFL-POSTER-154133

    Record created on 2010-11-04, modified on 2016-08-08


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