Method for fabricating micromirror for barcode reader, involves forming holes having diameter less than width of arms on both side of micromirror and wafer and on edges of region separating wafer and micromirror by etching arms

A method for fabricating a micromirror in a wafer, including the steps of: depositing and etching layers forming two arms; etching the wafer such that in the back face only a thin portion of the wafer remains in the region of formation of the micromirror and the arms; performing an anisotropic etch, such that the thin portion remains only in the areas of the micromirror and the arms; and performing an isotropic etch to remove the thin portions under the arms, the etching step for forming the arms being performed following their shape and so as to form holes traversing the arms, the holes being positioned at edges of the region separating the micromirror and the wafer on both the side of the micromirror and the side of the portions of the wafer remaining after the anisotropic etching step. The invention also concerns the micromirror.


Year:
2010
Keywords:
Note:
Alternative title(s) : (en) Thermally activated micromirror and fabrication method
Other identifiers:
EPO Family ID: 40380455
Laboratories:




 Record created 2010-06-30, last modified 2020-07-30


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