Time-resolved SiH4 density inside a chemical vapor deposition system: gas flow dynamics and glow discharge control
2010
Details
Title
Time-resolved SiH4 density inside a chemical vapor deposition system: gas flow dynamics and glow discharge control
Author(s)
Bartlome, Richard ; Descoeudres, Antoine ; Strahm, Benjamin ; Feltrin, Andrea ; De wolf, stefaan ; Ballif, Christophe
Conference
MRS Spring Meeting, San Francisco, USA, Apr. 5–9
Date
2010
Note
IMT-NE Number: 565
Laboratories
PV-LAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > PV-LAB - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Conference Papers
Work produced at EPFL
Published
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Conference Papers
Work produced at EPFL
Published
Record creation date
2010-06-01