Mechanisms of films and coatings formation from gaseous and liquid precursors with low pressure plasma spray equipment

Plasma spraying is a well developed and widely used technology, successfully applied for ceramic and metal coatings in many fields of applications such as aeronautics, gas turbine, automotive or medical. The coatings obtained are usually intentionally porous and thick (more than 100 pm). Presently, thin films (<mu m) are deposited using various physical vapour deposition (PVD) or chemical vapour deposition (CVD) processes with low deposition rates. In this paper, we make use of the high enthalpy and high ionisation degree of the plasma jet of conventional plasma spraying guns operated at low pressure (mbar) to obtain dense coatings by CVD from gaseous and/or liquid precursors. The advantages of such thermal plasma CVD processes are the high deposition rates to obtain dense and thin layers, and the possibility of combining these thin films with thermally sprayed coatings using the same equipment.


Published in:
Surface and Coatings Technology, 203, 15, 2125-2130
Presented at:
2nd International Workshop on Solution and Suspension Thermal Spraying, Tours, France, June 5-7, 2008
Year:
2009
Publisher:
Elsevier
ISSN:
0257-8972
ISBN:
0257-8972
Keywords:
Laboratories:
SPC
CRPP




 Record created 2010-05-19, last modified 2018-01-28


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