LATEST DEVELOPMENTS ON MICROMORPH TANDEM CELLS AT IMT

The latest developments on micromorph tandem cells in small area laboratory and large area industrial PE-CVD systems are reviewed. We report on a 13.3% initial efficiency micromorph tandem cell deposited in our small area system. The development of an in-situ silicon oxide based intermediate reflector layer (SOIR) was essential in order to achieve such high efficiencies. We describe its detailed material structure and discuss optical management aspects for different cell configurations. In our large area industrial R&D reactor the highest efficiency so far obtained is a 11.0% initial efficiency micromorph tandem cell. We discuss in detail the role of pressure and silane depletion on the cell parameters of single junction microcrystalline cells and present efficiency trends decreasing from 8.2% to 7.0% with deposition rates increasing from 0.3 nm/s to 1.2 nm/s.


Presented at:
18th PVSEC, Kolkata, January 2009
Year:
2009
Publisher:
Kolkata
Note:
IMT-NE Number: 551
Laboratories:




 Record created 2010-01-26, last modified 2018-03-17

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