Loading...
conference paper
Atomic processes during silicon oxidation: Oxygen diffusion through the oxide layer
2003
26th International Conference on the Physics of Semiconductors
Type
conference paper
Authors
Publication date
2003
Published in
26th International Conference on the Physics of Semiconductors
Issue
171
Start page
N3.2
Peer reviewed
REVIEWED
EPFL units
Event name | Event place | Event date |
Edinburgh, UK | 29 July-2 August, 2002 | |
Available on Infoscience
October 14, 2009
Use this identifier to reference this record