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research article
Modeling phase separation in nonstoichiometric silica
We have modeled the decomposition of nonstoichiometric amorphous SiOx upon annealing into silicon and stoichiometric silica, using a new method based on mapping Metropolis Monte Carlo simulations onto rate equations. The concentrations of all oxidation states of silicon are derived as a function of time and found to attain steady-state values at long times dependent on temperature T and oxygen content x. The degree of phase separation and the sizes of Si particles are predicted as a function of T and x, enabling greater control over the size of silicon quantum dots in silica matrices.
Type
research article
Web of Science ID
WOS:000224131400050
Authors
Publication date
2004
Published in
Volume
93
Issue
13
Article Number
135501
Peer reviewed
REVIEWED
EPFL units
Available on Infoscience
October 8, 2009
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